ETP240 Photoimageable Acid Etch Resist


ETP240 is a contact exposure, negative working photoimageable etch resist, formulated for roller or dip coating as a cost effective alternative to dry film-resist in the manufacture of high density multi-layer PCBs.
After acid etching it is easily removed in a sodium hydroxide solution or proprietary resist strippers.

• <25µm (1 mil) resolution capability. • Fast drying speed for high through-put production • Hard tack-free surface after drying allowing layers to be 75° stacked without blocking. • Excellent adhesion and conformance to copper surfaces. • High acid etch resistance. • Roller or dip coat

Technical Data Sheet:

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