ETP240 Photoimageable Acid Etch Resist
ETP240 is a contact exposure, negative working photoimageable etch resist, formulated for roller or dip coating as a cost effective alternative to dry film-resist in the manufacture of high density multi-layer PCBs.
After acid etching it is easily removed in a sodium hydroxide solution or proprietary resist strippers.
<25µm (1 mil) resolution capability. Fast drying speed for high through-put production Hard tack-free surface after drying allowing layers to be 75° stacked without blocking. Excellent adhesion and conformance to copper surfaces. High acid etch resistance. Roller or dip coat
Technical Data Sheet:
- File size:195 KB
- File type:PDF